SOBINMF for automatic removal of ocular artifacts from the EEG

Hirohisa Tsubakida, Yumie Ono, Atsushi Ishiyama

Research output: Contribution to journalArticle

Abstract

This paper introduces a novel method to automatically remove electro-oculogram (EOG) from electroencephalogram (EEG) using second-order blind identification (SOBI) and nonnegative matrix factorization (NMF). To demonstrate the effectiveness of the proposed method, we applied SOBI, NMF, or combined SOBI and NMF (SOBINMF) to the EEG data during motor imagery task in which participants imagined moving their left or right hand. Ocular artifacts were removed more effectively in our proposed SOBINMF method compared to SOBI or NMF alone.

Original languageEnglish
Pages (from-to)954-962
Number of pages9
JournalIEEJ Transactions on Electronics, Information and Systems
Volume135
Issue number8
DOIs
Publication statusPublished - 1 Aug 2015

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Keywords

  • Electro-oculogram artifact
  • Electroencephalogram
  • Nonnegative matrix factorization
  • Second order blind identification

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