CMOS-compatible vertical Si-waveguide coupler fabricated by ion implantation

Tomoya Yoshida, Emiko Omoda, Yuki Atsumi, Takashi Nishi, Syougo Tajima, Ryohei Takei, Noboru Miura, Masahiko Mori, Youichi Sakakibara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Few-micron-scale vertical silicon coupler that has weak wavelength dependence and weak incident angle dependence was achieved with vertically curved waveguide "elephant coupler" fabricated by ion implantation method compatible with CMOS technology.

Original languageEnglish
Title of host publicationIntegrated Photonics Research, Silicon and Nanophotonics, IPRSN 2016
PublisherOSA - The Optical Society
ISBN (Print)9781943580149
Publication statusPublished - 21 Jul 2014
EventIntegrated Photonics Research, Silicon and Nanophotonics, IPRSN 2016 - Vancouver, Canada
Duration: 18 Jul 201620 Jul 2016

Publication series

NameOptics InfoBase Conference Papers

Conference

ConferenceIntegrated Photonics Research, Silicon and Nanophotonics, IPRSN 2016
CountryCanada
CityVancouver
Period18/07/1620/07/16

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Yoshida, T., Omoda, E., Atsumi, Y., Nishi, T., Tajima, S., Takei, R., ... Sakakibara, Y. (2014). CMOS-compatible vertical Si-waveguide coupler fabricated by ion implantation. In Integrated Photonics Research, Silicon and Nanophotonics, IPRSN 2016 (Optics InfoBase Conference Papers). OSA - The Optical Society.